Sputtering onto liquids: a critical review

• Anastasiya Sergievskaya,
• Adrien Chauvin and
• Stephanos Konstantinidis

Beilstein J. Nanotechnol. 2022, 13, 10–53, doi:10.3762/bjnano.13.2

• colloidal synthesis, the review contains chapters explaining the basics of (magnetron) sputter deposition and the formation of NPs in solution. This review article covers more than 132 papers published on this topic from 1996 to September 2021 and aims at providing a critical analysis of most of the

• sputter deposition processes [44]. In Thornton’s report, the probe used for the heat flux measurement, whose temperature increases when submitted to the sputtering plasma, was a stainless-steel body weighing 200 mg. Ultimately, in the case of a solid substrate, the heat transfer and resulting increase of

• (discussed below), the formation of chemical bonds between, for instance, oxygen and deposited metal atoms, may occur and contribute to the increase of the amount of heat released on the surface, too. Thornton reported a substrate temperature in the range of 150 °C when measuring heat fluxes during magnetron

Ta₂N₃ nanocrystals grown in Al₂O₃ thin layers

• Krešimir Salamon,
• Maja Buljan,
• Iva Šarić,
• Mladen Petravić and
• Sigrid Bernstorff

Beilstein J. Nanotechnol. 2017, 8, 2162–2170, doi:10.3762/bjnano.8.215

• spectrometry (SIMS) and X-ray photoelectron spectroscopy (XPS). Experimental The films were grown as periodic multilayers by using the magnetron sputter deposition system KJLC CMS-18. In order to obtain tantalum nitride, the depositions were carried out in a reactive atmosphere containing 20% N2 and 80% Ar

Growth, structure and stability of sputter-deposited MoS₂ thin films

• Reinhard Kaindl,
• Bernhard C. Bayer,
• Roland Resel,
• Thomas Müller,
• Viera Skakalova,
• Gerlinde Habler,
• Rainer Abart,
• Alexey S. Cherevan,
• Dominik Eder,
• Maxime Blatter,
• Fabian Fischer,
• Jannik C. Meyer,
• Dmitry K. Polyushkin and
• Wolfgang Waldhauser

Beilstein J. Nanotechnol. 2017, 8, 1115–1126, doi:10.3762/bjnano.8.113

• measurements suggest directions for future work on our PVD MoS2 films. Keywords: electrode; hydrogen evolution reaction (HER); magnetron sputter deposition; MoS2; reticulated vitreous carbon (RVC) foam; SiO2/Si substrate; Introduction Molybdenum disulphide (MoS2) is a layered chemical compound comprised of

• (PVD) [27][28], which includes techniques such as magnetron sputter deposition, pulsed laser ablation or evaporation [3][29][30]. In this regard, PVD offers a wide processing window in terms of attainable deposition temperatures and substrates, constituent element fluxes and kinetic energies of the

• ≈10 to ≈1000 nm which were deposited by magnetron sputter deposition onto SiO2-coated silicon (Si) wafers and reticulated vitreous carbon (RVC) electrodes for water electrolysis. Surface morphology, structure, chemical composition, stability and electrical properties of MoS2 thin films deposited at